Our SurPass 3000 Cationic Photoresist Adhesion Promoter helps improve resist adhesion across substrates used in advanced lithography. We formulated SurPass 3000 as a waterborne, mildly acidic adhesion promoter with cleaning and surfactant properties. It modifies surface energy without depositing a permanent film or chemically changing the substrate. This makes it a practical solution for improving coating uniformity, resist adhesion, and overall process consistency across demanding micro- and nanofabrication applications.
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