Electron Beam Anti-Charge Agent
At DisChem, our electron beam anti-charge agent helps manage charge accumulation during electron beam lithography on non-conductive substrates. Our DisCharge H2O creates a conductive film over the...
At DisChem, our electron beam anti-charge agent helps manage charge accumulation during electron beam lithography on non-conductive substrates. Our DisCharge H2O creates a conductive film over the resist, helping dissipate electrons and support accurate patterning. Its water-based formulation is easy to apply and can be removed with water or IPA. We designed it to work with several common EBL resist systems, including PMMA, HSQ, CSAR 62, and ZEP 520A.
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